Now showing items 1-2 of 2

    • Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell 

      Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008)
    • Imaging performance of the EUV alpha demo tool at IMEC 

      Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008)