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    • CD metrology for EUV lithography and etch 

      Johanesen, H.; Kenslea, A.; Williamson, M.; Knowles, M.; Kwakman, L.; Levi, S.; Nishry, N.; Adan, O.; Englard, I.; Van Puymbroeck, Jan; Felder, Dan; Gov, S.; Cohen, O.; Turovets, I. (2015)