CD metrology for EUV lithography and etch

Thumbnail
View/open
Metadata
Show full item record
Authors
Johanesen, H.; Kenslea, A.; Williamson, M.; Knowles, M.; Kwakman, L.; Levi, S.; Nishry, N.; Adan, O.; Englard, I.; Van Puymbroeck, Jan; Felder, Dan; Gov, S.; Cohen, O.; Turovets, I.
Conference
26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC
Title
CD metrology for EUV lithography and etch
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections