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CD metrology for EUV lithography and etch
Publication:
CD metrology for EUV lithography and etch
Date
2015
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Johanesen, H.
;
Kenslea, A.
;
Williamson, M.
;
Knowles, M.
;
Kwakman, L.
;
Levi, S.
;
Nishry, N.
;
Adan, O.
;
Englard, I.
;
Van Puymbroeck, Jan
;
Felder, Dan
;
Gov, S.
;
Cohen, O.
;
Turovets, I.
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1925
since deposited on 2021-10-22
Acq. date: 2025-10-25
Citations
Metrics
Views
1925
since deposited on 2021-10-22
Acq. date: 2025-10-25
Citations