Browsing by imec author "932bfdb912d15c917ceff30f781d334147613cc1"
Now showing items 21-31 of 31
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Progress in EUV Lithography towards manufacturing from an exposure tool perspective
Hermans, Jan; Laidler, David; Foubert, Philippe; D'have, Koen; Cheng, Shaunee; Hendrickx, Eric; Dusa, Mircea (2012) -
Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails
Veloso, Anabela; Jourdain, Anne; Radisic, Dunja; Chen, Rongmei; Arutchelvan, Goutham; O'Sullivan, Barry; Arimura, Hiroaki; Stucchi, Michele; De Keersgieter, An; Hosseini, Maryam; Hopf, Toby; D'have, Koen; Wang, Shouhua; Dupuy, Emmanuel; Mannaert, Geert; Vandersmissen, Kevin; Iacovo, Serena; Marien, Philippe; Choudhury, Subhobroto; Schleicher, Filip; Sebaai, Farid; Oniki, Yusuke; Zhou, X.; Gupta, Anshul; Schram, Tom; Briggs, Basoene; Lorant, Christophe; Rosseel, Erik; Hikavyy, Andriy; Loo, Roger; Geypen, Jef; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Soulie, Jean-Philippe; Devriendt, Katia; Chan, BT; Demuynck, Steven; Hiblot, Gaspard; Van der Plas, Geert; Ryckaert, Julien; Beyer, Gerald; Dentoni Litta, Eugenio; Beyne, Eric; Horiguchi, Naoto (2022) -
Scanner matching for standard and freeform illumination shapes using FlexRay
Bekaert, Joost; Van Look, Lieve; D'have, Koen; Laenens, Bart; Vandenberghe, Geert; Van Adrichem, Paul; Shao, Wenjin; Ghan, J.; Schreel, Koen; Neumann, Jens Timo (2011) -
Scatterometry metrology validation with respect to process control
Leray, Philippe; Cheng, Shaunee; Laidler, David; D'have, Koen; Charley, Anne-Laure (2010) -
Sources of overlay error in double patterning integration schemes
Laidler, David; Leray, Philippe; D'have, Koen; Cheng, Shaunee (2008) -
Sources of overlay error in double patterning integration schemes
Laidler, David; Leray, Philippe; D'have, Koen; Cheng, Shaunee (2008) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
Track optimization and control for 32nm node double patterning and beyond
Laidler, David; Rosslee, Craig; D'have, Koen; Leray, Philippe; Tedeschi, Len (2009) -
Wafer alignment mark placement accuracy impact on the layer to layer overlay performance
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
Wafer based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings
van Haver, Sven; Coene, Wim M.J.; D'have, Koen; Geypen, Niels; Van Adrichem, Paul; de Winter, Laurens; Janssen, Augustus J.E.M.; Cheng, Shaunee (2014)