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The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
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The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
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Date
2019
Proceedings Paper
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43384.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van Haren, Richard
;
Steinert, Steffen
;
Mouraille, Orion
;
D'have, Koen
;
Van Dijk, Leon
;
Hermans, Jan
;
Beyer, Dirk
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1933
since deposited on 2021-10-27
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Acq. date: 2025-12-12
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Metrics
Views
1933
since deposited on 2021-10-27
2
last month
Acq. date: 2025-12-12
Citations