Authors

van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk

Conference

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

Title

The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

Publication type

Proceedings paper

Embargo date

9999-12-31