Authors

Mouraille, Orion; van Haren, Richard; Steinert, Steffen; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk

Conference

ASML Technology Conference 2019 's Hertogenbosch

Title

The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

Publication type

Oral presentation