Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Presentations
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Publication:
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Date
2019
Presentation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mouraille, Orion
;
van Haren, Richard
;
Steinert, Steffen
;
D'have, Koen
;
Van Dijk, Leon
;
Hermans, Jan
;
Beyer, Dirk
Journal
Abstract
Description
Metrics
Views
1936
since deposited on 2021-10-27
Acq. date: 2025-10-26
Citations
Metrics
Views
1936
since deposited on 2021-10-27
Acq. date: 2025-10-26
Citations