Now showing items 21-22 of 22

    • Strain enhanced FUSI/HfSiON technology with optimized CMOS process window 

      Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007)
    • The metal hard-mask approach for contact patterning 

      de Marneffe, Jean-Francois; Lazzarino, Frederic; Goossens, Danny; Conard, Thierry; Hoflijk, Ilse; Shamiryan, Denis; Struyf, Herbert; Boullart, Werner (2010)