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Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
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Authors
Veloso, Anabela
;
Verheyen, Peter
;
Vos, Rita
;
Brus, Stephan
;
Ito, Satoru
;
Mitsuhashi, Riichirou
;
Paraschiv, Vasile
;
Shi, Xiaoping
;
Onsia, Bart
;
Arnauts, Sophia
;
Loo, Roger
;
Lauwers, Anne
;
Conard, Thierry
;
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Baute, Debbie
;
Locorotondo, Sabrina
;
Chiarella, Thomas
;
Kerner, Christoph
;
Vrancken, Christa
;
Mertens, Sofie
;
O'Sullivan, Barry
;
Yu, HongYu
;
Chang, Shou-Zen
;
Niwa, Masaaki
;
Kittl, Jorge
;
Absil, Philippe
;
Jurczak, Gosia
;
Hoffmann, Thomas Y.
;
Biesemans, Serge
Conference
Symposium on VLSI Technology. Digest of Technical Papers
Title
Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Publication type
Proceedings paper
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