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Publication:

Strain enhanced FUSI/HfSiON technology with optimized CMOS process window

Date

2007
Proceedings Paper
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Author(s)

Veloso, Anabela  
;
Verheyen, Peter  
;
Vos, Rita  
;
Brus, Stephan  
;
Ito, Satoru
;
Mitsuhashi, Riichirou
;
Paraschiv, Vasile  
;
Shi, Xiaoping
;
Onsia, Bart  
;
Arnauts, Sophia  
;
Loo, Roger  
;
Lauwers, Anne  
;
Conard, Thierry  
;
de Marneffe, Jean-Francois  
;
Goossens, Danny  
;
Baute, Debbie
;
Locorotondo, Sabrina  
;
Chiarella, Thomas  
;
Kerner, Christoph  
;
Vrancken, Christa  
;
Mertens, Sofie  
;
O'Sullivan, Barry  
;
Yu, HongYu
;
Chang, Shou-Zen
;
Niwa, Masaaki
;
Kittl, Jorge
;
Absil, Philippe  
;
Jurczak, Gosia  
;
Hoffmann, Thomas Y.
;
Biesemans, Serge  

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1887 since deposited on 2021-10-16
Acq. date: 2025-10-23

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1887 since deposited on 2021-10-16
Acq. date: 2025-10-23

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