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Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Publication:
Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Verheyen, Peter
;
Vos, Rita
;
Brus, Stephan
;
Ito, Satoru
;
Mitsuhashi, Riichirou
;
Paraschiv, Vasile
;
Shi, Xiaoping
;
Onsia, Bart
;
Arnauts, Sophia
;
Loo, Roger
;
Lauwers, Anne
;
Conard, Thierry
;
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Baute, Debbie
;
Locorotondo, Sabrina
;
Chiarella, Thomas
;
Kerner, Christoph
;
Vrancken, Christa
;
Mertens, Sofie
;
O'Sullivan, Barry
;
Yu, HongYu
;
Chang, Shou-Zen
;
Niwa, Masaaki
;
Kittl, Jorge
;
Absil, Philippe
;
Jurczak, Gosia
;
Hoffmann, Thomas Y.
;
Biesemans, Serge
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1887
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1887
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations