Publication:

Strain enhanced FUSI/HfSiON technology with optimized CMOS process window

Date

2007
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVerheyen, Peter
dc.contributor.authorVos, Rita
dc.contributor.authorBrus, Stephan
dc.contributor.authorIto, Satoru
dc.contributor.authorMitsuhashi, Riichirou
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorShi, Xiaoping
dc.contributor.authorOnsia, Bart
dc.contributor.authorArnauts, Sophia
dc.contributor.authorLoo, Roger
dc.contributor.authorLauwers, Anne
dc.contributor.authorConard, Thierry
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGoossens, Danny
dc.contributor.authorBaute, Debbie
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorChiarella, Thomas
dc.contributor.authorKerner, Christoph
dc.contributor.authorVrancken, Christa
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.date.accessioned2021-10-16T21:17:02Z
dc.date.available2021-10-16T21:17:02Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13156
dc.source.beginpage200
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate12/06/2007
dc.source.conferencelocationKyoto
dc.source.endpage201
dc.title

Strain enhanced FUSI/HfSiON technology with optimized CMOS process window

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions