dc.contributor.author | Aresu, S. | |
dc.contributor.author | De Ceuninck, Ward | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Kaczer, Ben | |
dc.contributor.author | Knuyt, G. | |
dc.contributor.author | De Schepper, Luc | |
dc.date.accessioned | 2021-10-16T00:42:50Z | |
dc.date.available | 2021-10-16T00:42:50Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10021 | |
dc.source | IIOimport | |
dc.title | Understanding oxide degradation mechanisms in ultra-thin SiO2 through high-speed, high-resolution in-situ measurements | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Ceuninck, Ward | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Kaczer, Ben | |
dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
dc.source.peerreview | no | |
dc.source.beginpage | 182 | |
dc.source.endpage | 185 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.volume | 80 | |
imec.availability | Published - imec | |
imec.internalnotes | Paper from the 14th biennial Conference on Insulating Films on Semiconductors, Leuven, June 2005 | |