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90nm technology contact CD performance characterization via ODP scatterometry

dc.contributor.authorBarry, Kelly
dc.contributor.authorCheng, Shaunee
dc.contributor.authorStorms, Greet
dc.date.accessioned2021-10-16T00:44:11Z
dc.date.available2021-10-16T00:44:11Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10062
dc.sourceIIOimport
dc.title90nm technology contact CD performance characterization via ODP scatterometry
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage140
dc.source.endpage143
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XIX
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5752


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