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The impact of backside particles on the limits of optical lithography

dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorCompen, R.
dc.contributor.authorvan Meer, A.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T00:44:34Z
dc.date.available2021-10-16T00:44:34Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10070
dc.sourceIIOimport
dc.titleThe impact of backside particles on the limits of optical lithography
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.beginpage129
dc.source.endpage132
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol 103-104


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