Publication:

Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node

Date

2005

Proceedings Paper

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Author(s)

;

Philipsen, Vicky

;

Vandenberghe, Geert

;

van den Broeke, Doug

;

Degel, Wolfgang

;

Statistics

1902 since deposited on 2021-10-16

Acq. date: 2026-06-02