Show simple item record

Management of metallic contamination in advanced IC manufacturing

dc.contributor.authorBesson, P.
dc.contributor.authorBigot, C.
dc.contributor.authorGrouillet, A.
dc.contributor.authorJoly, J.P.
dc.contributor.authorClaes, Martine
dc.contributor.authorBearda, Twan
dc.contributor.authorFrickinger, J.
dc.date.accessioned2021-10-16T00:45:53Z
dc.date.available2021-10-16T00:45:53Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10092
dc.sourceIIOimport
dc.titleManagement of metallic contamination in advanced IC manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.source.peerreviewno
dc.source.beginpage3
dc.source.endpage11
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing IX
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions. Vol. 1, nr. 3


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record