Management of metallic contamination in advanced IC manufacturing
dc.contributor.author | Besson, P. | |
dc.contributor.author | Bigot, C. | |
dc.contributor.author | Grouillet, A. | |
dc.contributor.author | Joly, J.P. | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | Frickinger, J. | |
dc.date.accessioned | 2021-10-16T00:45:53Z | |
dc.date.available | 2021-10-16T00:45:53Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10092 | |
dc.source | IIOimport | |
dc.title | Management of metallic contamination in advanced IC manufacturing | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Claes, Martine | |
dc.source.peerreview | no | |
dc.source.beginpage | 3 | |
dc.source.endpage | 11 | |
dc.source.conference | Cleaning Technology in Semiconductor Device Manufacturing IX | |
dc.source.conferencedate | 16/10/2005 | |
dc.source.conferencelocation | Los Angeles, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | ECS Transactions. Vol. 1, nr. 3 |
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