Show simple item record

Breakdown spots on ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM

dc.contributor.authorBlasco, X.
dc.contributor.authorNafria, M.
dc.contributor.authorAymerich, X.
dc.contributor.authorPetry, Jasmine
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T00:46:52Z
dc.date.available2021-10-16T00:46:52Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10108
dc.sourceIIOimport
dc.titleBreakdown spots on ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage811
dc.source.endpage814
dc.source.journalMicroelectronics Reliability
dc.source.issue5_6
dc.source.volume45
imec.availabilityPublished - open access
imec.internalnotes13th Workshop on Dielectrics in Microelectronics


Files in this item

Thumbnail
Name:
14271.pdf
Size:
336.8Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record