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Flash memory with high-k tunnel dielectrics: comparative retention study

dc.contributor.authorBlomme, Pieter
dc.contributor.authorAkheyar, Amal
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-16T00:47:08Z
dc.date.available2021-10-16T00:47:08Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10112
dc.sourceIIOimport
dc.titleFlash memory with high-k tunnel dielectrics: comparative retention study
dc.typeProceedings paper
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.beginpage239
dc.source.endpage241
dc.source.conference1st International Conference on Memory Technology and Design
dc.source.conferencedate21/05/2005
dc.source.conferencelocationGiens France
imec.availabilityPublished - imec


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