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dc.contributor.authorBlomme, Pieter
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorRosmeulen, Maarten
dc.contributor.authorAkheyar, Amal
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorLorenzini, Martino
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-16T00:47:13Z
dc.date.available2021-10-16T00:47:13Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10113
dc.sourceIIOimport
dc.titleHigk-k materials for tunnel barrier engineering in floating-gate flash memories
dc.typeMeeting abstract
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorRosmeulen, Maarten
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRosmeulen, Maarten::0000-0002-3663-7439
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.conferenceMeeting Abstracts 208th Electrochemical Society
dc.source.conferencedate1/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 0497


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