dc.contributor.author | Blomme, Pieter | |
dc.contributor.author | Govoreanu, Bogdan | |
dc.contributor.author | Rosmeulen, Maarten | |
dc.contributor.author | Akheyar, Amal | |
dc.contributor.author | Haspeslagh, Luc | |
dc.contributor.author | De Vos, Joeri | |
dc.contributor.author | Lorenzini, Martino | |
dc.contributor.author | Van Houdt, Jan | |
dc.contributor.author | De Meyer, Kristin | |
dc.date.accessioned | 2021-10-16T00:47:13Z | |
dc.date.available | 2021-10-16T00:47:13Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10113 | |
dc.source | IIOimport | |
dc.title | Higk-k materials for tunnel barrier engineering in floating-gate flash memories | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Blomme, Pieter | |
dc.contributor.imecauthor | Govoreanu, Bogdan | |
dc.contributor.imecauthor | Rosmeulen, Maarten | |
dc.contributor.imecauthor | Haspeslagh, Luc | |
dc.contributor.imecauthor | De Vos, Joeri | |
dc.contributor.imecauthor | Van Houdt, Jan | |
dc.contributor.imecauthor | De Meyer, Kristin | |
dc.contributor.orcidimec | Rosmeulen, Maarten::0000-0002-3663-7439 | |
dc.contributor.orcidimec | De Vos, Joeri::0000-0002-9332-9336 | |
dc.contributor.orcidimec | Van Houdt, Jan::0000-0003-1381-6925 | |
dc.source.peerreview | no | |
dc.source.conference | Meeting Abstracts 208th Electrochemical Society | |
dc.source.conferencedate | 1/10/2005 | |
dc.source.conferencelocation | Los Angeles, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Abstract 0497 | |