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Growth kinetics and relaxation mechanism of very thin epitaxial Si films on (100) germanium

dc.contributor.authorBonzom, Renaud
dc.contributor.authorLeys, Frederik
dc.contributor.authorLoo, Roger
dc.contributor.authorRichard, Olivier
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorRip, Jens
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorMeuris, Marc
dc.date.accessioned2021-10-16T00:48:27Z
dc.date.available2021-10-16T00:48:27Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10129
dc.sourceIIOimport
dc.titleGrowth kinetics and relaxation mechanism of very thin epitaxial Si films on (100) germanium
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conferenceMRS 2005 Spring Meeting Symposium P: In situ Studies of Gas/Solid Surface Reaction Dynamics
dc.source.conferencedate28/03/2005
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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