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Source polarization and OPC effects on illumination optimization

dc.contributor.authorBrist, Travis
dc.contributor.authorBailey, George E.
dc.contributor.authorDrozdov, Alexander
dc.contributor.authorTorres, Andres
dc.contributor.authorEstroff, Andrew
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-16T00:50:40Z
dc.date.available2021-10-16T00:50:40Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10156
dc.sourceIIOimport
dc.titleSource polarization and OPC effects on illumination optimization
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.source.peerreviewno
dc.source.beginpage599232
dc.source.conference25th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate3/10/2005
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5992


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