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Impact of AAPSM etch depth linearity in ArF immersion lithography

dc.contributor.authorCangemi, Michael
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLeunissen, Peter
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.authorJonckheere, Rik
dc.contributor.authorMartin, Patrick
dc.contributor.authorWakefield, Clare
dc.contributor.authorBuxbaum, Alex
dc.contributor.authorMorisson, Troy
dc.date.accessioned2021-10-16T00:52:17Z
dc.date.available2021-10-16T00:52:17Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10174
dc.sourceIIOimport
dc.titleImpact of AAPSM etch depth linearity in ArF immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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