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Si, SiGe and Ge: high carrier mobility technology through selective and non-selective epitaxial deposition
Publication:
Si, SiGe and Ge: high carrier mobility technology through selective and non-selective epitaxial deposition
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Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Caymax, Matty
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Abstract
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1816
since deposited on 2021-10-16
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Acq. date: 2025-12-17
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Metrics
Views
1816
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-17
Citations