Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging
Publication:
Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging
Copy permalink
Date
2005
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chiou, T.-B.
;
Chen, A.
;
Hsu, Stephen D.
;
Eurlings, M.
;
Hendrickx, Eric
Journal
Abstract
Description
Metrics
Views
1861
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2025-12-10
Citations
Metrics
Views
1861
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2025-12-10
Citations