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Stress relaxation in Al-Si-Cu thin films and lines

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorProost, Joris
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorRoussel, Philippe
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T13:26:23Z
dc.date.available2021-09-29T13:26:23Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1022
dc.sourceIIOimport
dc.titleStress relaxation in Al-Si-Cu thin films and lines
dc.typeProceedings paper
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage441
dc.source.endpage446
dc.source.conferenceThin Films: Stresses and Mechanical Properties
dc.source.conferencedate28/11/1994
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 356


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