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High-k gate stack engineering – towards meeting low standby power and high performance targets

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBrunco, David
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDate, Lucien
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHoussa, Michel
dc.contributor.authorHyun, Sangjin
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKubicek, Stefan
dc.contributor.authorMaes, Jan
dc.contributor.authorPantisano, Luigi
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorRohr, Erika
dc.contributor.authorSchram, Tom
dc.contributor.authorShimamoto, Y.
dc.contributor.authorSleeckx, Erik
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorYamada, Naoki
dc.contributor.authorWitters, Thomas
dc.contributor.authorZhao, Chao
dc.contributor.authorZimmerman, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T01:07:06Z
dc.date.available2021-10-16T01:07:06Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10293
dc.sourceIIOimport
dc.titleHigh-k gate stack engineering – towards meeting low standby power and high performance targets
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecWitters, Thomas::0000-0002-8528-9469
dc.source.peerreviewno
dc.source.beginpage109
dc.source.endpage117
dc.source.conferenceAdvanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment
dc.source.conferencedate15/05/2005
dc.source.conferencelocationQuebec Canada
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; Vol. 2005-05


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