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In-line plasma surface etching and PECVD SiNX:H deposition for crystalline Si solar cell processing

dc.contributor.authorDe Wolf, Stefaan
dc.contributor.authorSchade, K.
dc.contributor.authorDekkers, Harold
dc.contributor.authorBeaucarne, Guy
dc.date.accessioned2021-10-16T01:14:31Z
dc.date.available2021-10-16T01:14:31Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10341
dc.sourceIIOimport
dc.titleIn-line plasma surface etching and PECVD SiNX:H deposition for crystalline Si solar cell processing
dc.typeProceedings paper
dc.contributor.imecauthorDekkers, Harold
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.source.peerreviewno
dc.source.beginpage729
dc.source.endpage732
dc.source.conferenceProceedings of the 20th European Photovoltaic Solar Engergy Conference and Exhibition
dc.source.conferencedate6/06/2005
dc.source.conferencelocationBarcelona Spain
imec.availabilityPublished - imec


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