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Studies and optimization of HfO2 grown by HfCl4/H2O atomic layer deposition

dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorBrijs, Bert
dc.contributor.authorBrunco, David
dc.contributor.authorConard, Thierry
dc.contributor.authorSleeckx, Erik
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T01:18:24Z
dc.date.available2021-10-16T01:18:24Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10365
dc.sourceIIOimport
dc.titleStudies and optimization of HfO2 grown by HfCl4/H2O atomic layer deposition
dc.typeMeeting abstract
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage547
dc.source.conferenceMeeting Abstracts 208th Meeting of The Electrochemical Society
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec


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