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Atomic layer deposition of hafnium oxide on germanium substrates

dc.contributor.authorDelabie, Annelies
dc.contributor.authorPuurunen, R.
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorOnsia, Bart
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorZhao, Chao
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorViitanan, Minna M.
dc.contributor.authorBrongersma, Hidde H.
dc.contributor.authorDe Ridder, M.
dc.contributor.authorGoncharova, L.
dc.contributor.authorGarfunkel, Eric
dc.contributor.authorGustafsson, Torgny
dc.contributor.authorTsai, Wilman
dc.date.accessioned2021-10-16T01:18:38Z
dc.date.available2021-10-16T01:18:38Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10366
dc.sourceIIOimport
dc.titleAtomic layer deposition of hafnium oxide on germanium substrates
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.beginpage64104
dc.source.journalJ. Applied Physics
dc.source.issue6
dc.source.volume97
imec.availabilityPublished - imec


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