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Influence of hydrogen on chemical vapor deposition of tungsten on sputter-deposited TiN layers

dc.contributor.authorZhang, S. L.
dc.contributor.authorPalmans, Roger
dc.contributor.authorKeinonen, J.
dc.contributor.authorPetersson, C. S.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T13:28:01Z
dc.date.available2021-09-29T13:28:01Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1042
dc.sourceIIOimport
dc.titleInfluence of hydrogen on chemical vapor deposition of tungsten on sputter-deposited TiN layers
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage2998
dc.source.endpage3000
dc.source.journalAppl. Phys. Lett.
dc.source.volume67
imec.availabilityPublished - imec


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