Show simple item record

Validation of immersion lithography OPC model accuracy

dc.contributor.authorEstroff, Andrew
dc.contributor.authorBailey, George
dc.contributor.authorKostas, Adam
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-16T01:31:36Z
dc.date.available2021-10-16T01:31:36Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10437
dc.sourceIIOimport
dc.titleValidation of immersion lithography OPC model accuracy
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record