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Performance of a linear single wafer IPA vapour based drying system

dc.contributor.authorFyen, Wim
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDoumen, Geert
dc.contributor.authorVereecke, Guy
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T01:38:12Z
dc.date.available2021-10-16T01:38:12Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10471
dc.sourceIIOimport
dc.titlePerformance of a linear single wafer IPA vapour based drying system
dc.typeProceedings paper
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.beginpage75
dc.source.endpage78
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol 103-104


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