Show simple item record

In-line monitoring of acid and base contaminants at low pptlevels for 193nm lithography

dc.contributor.authorGronheid, Roel
dc.contributor.authorAl-Horr, Rida
dc.date.accessioned2021-10-16T01:50:21Z
dc.date.available2021-10-16T01:50:21Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10528
dc.sourceIIOimport
dc.titleIn-line monitoring of acid and base contaminants at low pptlevels for 193nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.beginpage1591
dc.source.endpage1600
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5754


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record