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Grazing incidence X-ray fluorescence spectrometry for compositional analysis of nanometer-thin high-k dielectric HfO2 layers

dc.contributor.authorHellin, David
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorBeaven, Peter
dc.contributor.authorConard, Thierry
dc.contributor.authorBrijs, Bert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T01:57:52Z
dc.date.available2021-10-16T01:57:52Z
dc.date.issued2005-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10562
dc.sourceIIOimport
dc.titleGrazing incidence X-ray fluorescence spectrometry for compositional analysis of nanometer-thin high-k dielectric HfO2 layers
dc.typeJournal article
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage845
dc.source.endpage850
dc.source.journalAnalytical Sciences
dc.source.issue7
dc.source.volume21
imec.availabilityPublished - imec


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