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Remediation for TXRF saturation effects on micro-droplet residues from preconcentration methods on semiconductor wafers

dc.contributor.authorHellin, David
dc.contributor.authorRip, Jens
dc.contributor.authorGeens, Veerle
dc.contributor.authorDelande, Tinne
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T01:59:03Z
dc.date.available2021-10-16T01:59:03Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10567
dc.sourceIIOimport
dc.titleRemediation for TXRF saturation effects on micro-droplet residues from preconcentration methods on semiconductor wafers
dc.typeJournal article
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage652
dc.source.endpage658
dc.source.journalJournal of Analytical Atomic Spectrometry
dc.source.issue7
dc.source.volume20
imec.availabilityPublished - imec


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