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Complementary dipole exposure solutions at 0.29k1

dc.contributor.authorHendrickx, Eric
dc.contributor.authorTorres, Andres
dc.contributor.authorLafferty, Neal
dc.contributor.authorLe Cam, Laurent
dc.contributor.authorJohnson, Stephen
dc.contributor.authorReita, Carlo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMaurer, Wilhelm
dc.date.accessioned2021-10-16T01:59:45Z
dc.date.available2021-10-16T01:59:45Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10570
dc.sourceIIOimport
dc.titleComplementary dipole exposure solutions at 0.29k1
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage327
dc.source.endpage338
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5754


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