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Present reliability issues in ultrathin oxinitride films

dc.contributor.authorKaczer, Ben
dc.contributor.authorDegraeve, Robin
dc.contributor.authorArkhipov, Vladimir
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-16T02:25:09Z
dc.date.available2021-10-16T02:25:09Z
dc.date.issued2005-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10670
dc.sourceIIOimport
dc.titlePresent reliability issues in ultrathin oxinitride films
dc.typeProceedings paper
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.source.peerreviewno
dc.source.beginpage307
dc.source.endpage326
dc.source.conferenceSilicon Nitride and Silicon Dioxide Thin Insulating Films and Other Emerging Dielectrics VIII
dc.source.conferencedate16/05/2005
dc.source.conferencelocationQuebec Canada
imec.availabilityPublished - imec


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