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Effect of chemical solution on the stability of low-k films

dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T02:29:27Z
dc.date.available2021-10-16T02:29:27Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10686
dc.sourceIIOimport
dc.titleEffect of chemical solution on the stability of low-k films
dc.typeProceedings paper
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.beginpage349
dc.source.endpage352
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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