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Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography

dc.contributor.authorKim, Hyun-Woo
dc.contributor.authorDelvaux, Christie
dc.contributor.authorBaerts, Christina
dc.contributor.authorGronheid, Roel
dc.contributor.authorFoubert, Philippe
dc.contributor.authorKishimura, Shinji
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-16T02:32:01Z
dc.date.available2021-10-16T02:32:01Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10696
dc.sourceIIOimport
dc.titleEffect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorErcken, Monique
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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