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Impact of water and top-coats on lithographic performance in 193nm immersion lithography

dc.contributor.authorKishimura, Shinji
dc.contributor.authorGronheid, Roel
dc.contributor.authorErcken, Monique
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMatsuo, Takahiro
dc.contributor.authorEndo, Masayuki
dc.contributor.authorSasago, Masaru
dc.date.accessioned2021-10-16T02:32:31Z
dc.date.available2021-10-16T02:32:31Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10698
dc.sourceIIOimport
dc.titleImpact of water and top-coats on lithographic performance in 193nm immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorErcken, Monique
dc.source.peerreviewno
dc.source.beginpage20
dc.source.endpage30
dc.source.conferenceAdvances in Resist Technology and Processing XXII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5753


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