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Scanning spreading resistance microscopy of two-dimensional diffusion of boron implanted in free-standing silicon nanostructures

dc.contributor.authorKluth, S.M.
dc.contributor.authorAlvarez, C.
dc.contributor.authorTrellenkamp, St.
dc.contributor.authorMoers, J.
dc.contributor.authorMantl, S.
dc.contributor.authorKretz, J.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T02:34:36Z
dc.date.available2021-10-16T02:34:36Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10705
dc.sourceIIOimport
dc.titleScanning spreading resistance microscopy of two-dimensional diffusion of boron implanted in free-standing silicon nanostructures
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage76
dc.source.endpage79
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue1
dc.source.volume23
imec.availabilityPublished - imec


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