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The kinetics and mechanism of the etching of CoSi2 in HF-based solutions
Publication:
The kinetics and mechanism of the etching of CoSi2 in HF-based solutions
Date
1996
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baklanov, Mikhaïl
;
Badmaeva, I. A.
;
Alves Donaton, Ricardo
;
Sveshnikova, L. L.
;
Storm, Wolfgang
;
Maex, Karen
Journal
Journal of the Electrochemical Society
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1935
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1935
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-09
Citations