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A methodology for the characterization of topography induced immersion bubble defects

dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorKim, Young-Chang
dc.contributor.authorWells, Greg
dc.contributor.authorList, Scott
dc.contributor.authorDiBiase, Tony
dc.date.accessioned2021-10-16T02:37:38Z
dc.date.available2021-10-16T02:37:38Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10717
dc.sourceIIOimport
dc.titleA methodology for the characterization of topography induced immersion bubble defects
dc.typeProceedings paper
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage154
dc.source.endpage163
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5754


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