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Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS

dc.contributor.authorKubicek, Stefan
dc.contributor.authorVeloso, Anabela
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorHayashi, Shigenori
dc.contributor.authorYamamoto, Kazuhiko
dc.contributor.authorMitsuhashi, Riichirou
dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorHorii, S.
dc.contributor.authorHarada, Y.
dc.contributor.authorKubota, M.
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-16T02:40:39Z
dc.date.available2021-10-16T02:40:39Z
dc.date.issued2005-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10727
dc.sourceIIOimport
dc.titleNi-FUSI on high-k as a candidate for 65nm LSTP CMOS
dc.typeProceedings paper
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage99
dc.source.endpage100
dc.source.conferenceProceedings IEEE VLSI-TSA International Symposium on VLSI Technology
dc.source.conferencedate25/04/2005
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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