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Protective films formed by RIE of Co and Ti silicides and ways of their removal

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorKim, Young-Chang
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T14:16:28Z
dc.date.available2021-09-29T14:16:28Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1072
dc.sourceIIOimport
dc.titleProtective films formed by RIE of Co and Ti silicides and ways of their removal
dc.typeProceedings paper
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage171
dc.source.endpage174
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


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