Show simple item record

Physically-based compact models for fast lithography simulation

dc.contributor.authorLafferty, Neal
dc.contributor.authorAdam, Kostas
dc.contributor.authorGranik, Yuri
dc.contributor.authorTorres, Andres
dc.contributor.authorMaurer, Wilhelm
dc.date.accessioned2021-10-16T02:41:56Z
dc.date.available2021-10-16T02:41:56Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10732
dc.sourceIIOimport
dc.titlePhysically-based compact models for fast lithography simulation
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage537
dc.source.endpage542
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate1/03/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5754


Files in this item

Thumbnail
Name:
19173.pdf
Size:
969.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record