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Mask blank stress birefringence requirements for hyper-NA lithography

dc.contributor.authorLeunissen, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.authorDemarteau, M.
dc.contributor.authorvan de Kerkhof, M.
dc.contributor.authorde Boeij, Wim
dc.contributor.authorWaelpoel, J.
dc.contributor.authorMartin, Patrick
dc.contributor.authorCangemi, Michael
dc.date.accessioned2021-10-16T02:54:04Z
dc.date.available2021-10-16T02:54:04Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10776
dc.sourceIIOimport
dc.titleMask blank stress birefringence requirements for hyper-NA lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conference193 Immersion Symposium
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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