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Profile optimization for dry etched Ge-containing Si-gates

dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBrus, Stephan
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T03:00:41Z
dc.date.available2021-10-16T03:00:41Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10799
dc.sourceIIOimport
dc.titleProfile optimization for dry etched Ge-containing Si-gates
dc.typeProceedings paper
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference8th Technical and Scientific Meeting of CREMSI
dc.source.conferencedate20/10/2005
dc.source.conferencelocationFuveau France
imec.availabilityPublished - imec


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