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Roadblocks and critical aspect of cleaning for sub-65nm technologies

dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T03:26:05Z
dc.date.available2021-10-16T03:26:05Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10886
dc.sourceIIOimport
dc.titleRoadblocks and critical aspect of cleaning for sub-65nm technologies
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.beginpage95
dc.source.endpage96
dc.source.conferenceProceedings IEEE VLSI-TSA International Symposium on VLSI Technology
dc.source.conferencedate25/04/2005
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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