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The future of high-k on pure germanium and its importance for Ge CMOS

dc.contributor.authorMeuris, Marc
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKubicek, Stefan
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorWinderickx, Gillis
dc.contributor.authorVan Moorhem, Els
dc.contributor.authorPuurunen, R.
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorZhao, Chao
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorSchram, Tom
dc.contributor.authorChiarella, Thomas
dc.contributor.authorOnsia, Bart
dc.contributor.authorTeerlinck, I
dc.contributor.authorHoussa, Michel
dc.contributor.authorMertens, Paul
dc.contributor.authorRaskin, G.
dc.contributor.authorMijlemans, P.
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T03:27:06Z
dc.date.available2021-10-16T03:27:06Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10889
dc.sourceIIOimport
dc.titleThe future of high-k on pure germanium and its importance for Ge CMOS
dc.typeJournal article
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorWinderickx, Gillis
dc.contributor.imecauthorVan Moorhem, Els
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage203
dc.source.endpage207
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue1_3
dc.source.volume8
imec.availabilityPublished - imec


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